“With the high-variability phenomenon appearing below 40nm technology nodes, ICLys^TM can contribute to improving the process-variability exploration for our FD-SOI technologies while providing a very significant cost reduction to statistical verifications by simulation,” said Jean-Paul Morin, AMS/RF CAD flow manager at STMicroelectronics.

Infiniscale is a partner of Mentor Graphics Corp. . Close collaboration speeds up interface developpement and complements Mentor offer to customers facing Analog DFY challenges. “Lysis™ from Infiniscale generates behavioral models based upon Eldo™ accurate and silicon-proven simulation technology. Models do include design, temperature and power-supply parameters but also technology parameters from the design kit. Once models are built, DFY becomes a reality since yield and performance optimization is performed in minutes. Eldo™ and Lysis™ provide users with an outstanding performance increase forsub-65 nm designs where corner-based approach is no more an option.

We successfully run Lysis on different circuits for power management and memories in 40n and 32n CMOS, the model generation for each circuit outputs as functions of the process parameters is very efficient. The tool offers very powerful post-process engines to improve the circuit performances and to center for better yield.On a TERCAM sense amplifier with its Dummy Path, for instance, the tool allows us to save 30% in timing together with 12% reduction in power consumption, over the global process space. In addition, the tool fits perfectly, but with more power, with our existing techniques for process variability simulation of full custom or analog cells

In order to deliver customer-oriented circuits based on our unique planar nano-electronic devices and printed programmable logic architecture, we need a fast and accurate methor for quickly producing and iterating simulation models. The InfiniScale tools meet our needs perfectly.